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SBMP1-OH-CP
SBMP1OHCP
ResinTech SBMP1-OH-CP is a polisher grade type 1 macroporous strong base anion resin in hydroxide form. It offers high capacity and resistance to both thermal and chemical oxidation. It is a controlled particle size resin optimized for minimal pressure loss and perfect separation from “CP” grade cation resins.
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Product Description
ResinTech SBMP1-OH-CP is a polisher grade type 1 macroporous strong base anion resin in hydroxide form. It offers high capacity and resistance to both thermal and chemical oxidation. It is a controlled particle size resin optimized for minimal pressure loss and perfect separation from “CP” grade cation resins. SBMP1-OH-CP is ideally suited for high flow rate, deep bed condensate polishing applications when paired with either CG10-H-CP or SACMP-H-CP.
Features and Benefits
- Macroporous structure
- Organic fouling resistance
- Superior physical stability
- Complies with US FDA regulations
Applications
High Purity DI Water
Condensate Polishing
Ultrapure Water Production (UPW)
Demineralization / DI
Mixed Bed Components
Silica Removal
Contaminants
Chloride
Sulfate
Nitrate
Carbon Dioxide
Silica
Bicarbonate
Alkalinity
Hydroxide
Carbonate
Markets
Power Generation,Nuclear,Industrial Water,Life Sciences & Ultrapure Water,Ethanol
Free Resources to Make Your Job Easier
Physical Properties
Products
SBMP1-OH-CP
SKU
SBMP1OHCP
Polymer Matrix
Styrene/DVB
Ionic Form
Hydroxide (OH⁻)
{"Functional Group":"Trimethylamine","Physical Form":"Spherical Beads","Media Color":"Tan to Brown","Grade":"Condensate Polishing","Mesh Type":"Standard","Particle Size Range":"16 - 50 US mesh (1190μ - 297μ)","Minimum Sphericity %":97,"Moisture Retention (%)":"64 to 73","Reversible Swelling":"18 to 25% (Cl → OH)","Operation pH Range":"0 to 14","Max Continuous Temp":"140°F (60°C)","Max Pressure Loss":"20 psi (138 kPa)","Capacity (meq/mL)":0.9,"Ship. Wt. (lbs/cu.ft.)":40,"Shipping Weight":"39 - 41 lbs/cu.ft. (625 - 657 g/L)","Minimum Order Volume":"210 cuft. (5947 L)","Uniformity Coefficient":1.6}
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